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Reaction Mechanisms in Both a CCl2F2/O2/Ar and a CCl2F2/H2/Ar RF Plasma Environment

✍ Scribed by Ya-Feng Wang; Wen-Jhy Lee; Chuh-Yung Chen; Yo-Ping Greg Wu; Guo-Ping Chang-Chien

Book ID
110246490
Publisher
Springer
Year
2000
Tongue
English
Weight
356 KB
Volume
20
Category
Article
ISSN
0272-4324

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Rate coefficients and ClO radical yields
Rate coefficients and ClO radical yields in the reaction of O(1D) with CClF2CCl2F, CCl3CF3, CClF2CClF2, and CCl2FCF3
✍ Munkhbayar Baasandorj; Karl J. Feierabend; James B. Burkholder πŸ“‚ Article πŸ“… 2011 πŸ› John Wiley and Sons 🌐 English βš– 145 KB πŸ‘ 1 views

## Abstract Rate coefficients, __k__, and ClO radical product yields, __Y__, for the gas‐phase reaction of O(^1^D) with CClF~2~CCl~2~F (CFC‐113) (__k__~2~), CCl~3~CF~3~ (CFC‐113a) (__k__~3~), CClF~2~CClF~2~ (CFC‐114) (__k__~4~), and CCl~2~FCF~3~ (CFC‐114a) (__k__~5~) at 296 K are reported. Rate coe