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Reaction kinetics and reactor modeling of the plasma etching of silicon

✍ Scribed by H. G. Stenger Jr.; H. S. Caram; C. F. Sullivan; W. M. Russo

Publisher: American Institute of Chemical Engineers
Year: 1987
Tongue: English
Weight: 980 KB
Volume: 33
Category: Article
ISSN: 0001-1541
DOI: 10.1002/aic.690330713

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