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Etching of silicon trenches in CF4 plasma using photoresist/aluminium masks

✍ Scribed by Dr. B. Glück; W. Höppner

Publisher: John Wiley and Sons
Year: 1990
Tongue: English
Weight: 415 KB
Volume: 25
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.2170250309

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