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Rate of decomposition of hexafluoroazomethane and the absolute rate of recombination of trifluoromethyl radical at higher temperatures

✍ Scribed by M. Rossi; D. M. Golden

Publisher: John Wiley and Sons
Year: 1979
Tongue: English
Weight: 657 KB
Volume: 11
Category: Article
ISSN: 0538-8066
DOI: 10.1002/kin.550110709

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✦ Synopsis

Abstract

The unimolecular homogeneous decomposition of hexafluoroazomethane was studied in a VLPP apparatus in the temperature range 720–1050 K and is consistent with the following Arrhenius parameters:

at 900 K, where the A factor was assumed to be the same as for 2,2′‐azoisobutane. The homogeneous rate of recombination of ·CF~3~ radicals at temperatures around 1000 K was also studied under VLPP conditions and was found to be in the fall‐off region, corresponding to k/k^∞^ = 8.5 × 10^−3^ when a rotational transition‐state model was used. This model predicts an essentially constant value of k~r~^∞^ of 10^9.7^ over the temperature range 300–1000 K.

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