Rate constants for the etching of gallium arsenide by atomic chlorine
โ Scribed by Jae H. Hat; Elmer A. Ogryzlo
- Publisher
- Springer
- Year
- 1991
- Tongue
- English
- Weight
- 386 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0272-4324
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The pulsed laser photolysis-resonance fluorescence technique has been used to determine the absolute rate coefficient for the Cl atom reaction with a series of ketones, at room temperature (298 ฯฎ 2) K and in the pressure range 15-60 Torr. The rate coefficients obtained (in units of cm 3 molecule ฯช1
## Abstract The relative rate technique has been used to determine the rate constants for the reactions Cl + CH~3~OCHCl~2~ โ products and Cl + CH~3~OCH~2~CH~2~Cl โ products. Experiments were carried out at 298 ยฑ 2 K and atmospheric pressure using nitrogen as the bath gas. The decay rates of the org
Constants of the rawions of Cl with HIOz. IX&, 03, CH4, and HNC)J wertt mezxured at 295 K using a flaw discharge-mass spectrometric method. The rate consmts are, WpectiveIy, (6.2 ?c I.51 X 10qzS, (32&) x 10"tl, (1.3 -+. 0.3) X lo-'t, (1.2 ?t 0.3) X 10-13, and (6.8 t 3.4) X lO-is cm3/s.