Rapid vapor deposition SiO2 thin film deposited at a low temperature using tris(tert-pentoxy)silanol and trimethyl-aluminum

✍ Scribed by Choi, Dong-won; Chung, Kwun-Bum; Park, Jin-Seong

• Book ID: 122574878
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 790 KB
• Volume: 142
• Category: Article
• ISSN: 0254-0584
• DOI: 10.1016/j.matchemphys.2013.08.004