Deep levels in rapid thermal annealed Ga
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P. KamiΕski; G. Gawlik; R. KozΕowski
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Article
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1994
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Elsevier Science
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English
β 398 KB
The effect of rapid thermal annealing conditions on the defect levels existing in bulk Si-doped n-GaAs was investigated by deeplevel transient spectroscopy. The concentrations of four electron traps at E c -0.36 eV (T 1 ), Ec -0.37 eV (T2), E c -0.55 eV (T3) and Ec-0.75 eV (T4) were found to be depe