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Rapid preparation of indium tin oxide sputtering targets by spark plasma sintering

โœ Scribed by T. Takeuchi; T. Ishida; K. Ichikawa; S. Miyamoto; M. Kawahara; H. Kageyama

Book ID
110340571
Publisher
Springer
Year
2002
Tongue
English
Weight
65 KB
Volume
21
Category
Article
ISSN
0261-8028

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Preparation of indium tin oxide (ITO) na
Preparation of indium tin oxide (ITO) nanoparticles by DC arc plasma
โœ Dong-Wook Kim; Dong-Wha Park ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 797 KB

Tin-doped indium oxide (ITO) nanoparticles were prepared by DC arc plasma. The mixture of In(OH) 3 and SnCl 2 as precursors was injected into the arc plasma through a powder feeder and vaporized by the arc plasma. The ITO nanoparticles were synthesized through the rapid quenching of the thermal plas