Patterning of Substrates Using Surface R
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S. Yang; K. Yang; L. Niu; R. Nagarajan; S. Bian; A. K. Jain; J. Kumar
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Article
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2004
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John Wiley and Sons
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English
⚖ 191 KB
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**A maskless method for patterning substrates** using surface relief structures on azobenzene‐functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spin‐coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxyg