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Patterning of Substrates Using Surface Relief Structures on an Azobenzene-Functionalized Polymer Film

✍ Scribed by S. Yang; K. Yang; L. Niu; R. Nagarajan; S. Bian; A. K. Jain; J. Kumar

Publisher: John Wiley and Sons
Year: 2004
Tongue: English
Weight: 191 KB
Volume: 16
Category: Article
ISSN: 0935-9648
DOI: 10.1002/adma.200306537

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✦ Synopsis

A maskless method for patterning substrates using surface relief structures on azobenzene‐functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spin‐coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxygen plasma followed by a zinc‐powder‐catalyzed liquid etchant yields a periodically patterned ITO substrate (see Figure).

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