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Raman study of stress-relieved silicon-on-sapphire films prepared by cw-laser annealing

✍ Scribed by Mavi, H. S.; Shukla, A. K.; Jain, K. P.; Abbi, S. C.; Beserman, R.


Book ID
121849865
Publisher
American Institute of Physics
Year
1991
Tongue
English
Weight
793 KB
Volume
69
Category
Article
ISSN
0021-8979

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