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Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon

✍ Scribed by Gogotsi, Y; Baek, C; Kirscht, F

Book ID: 121373642
Publisher: Institute of Physics
Year: 1999
Tongue: English
Weight: 847 KB
Volume: 14
Category: Article
ISSN: 0268-1242
DOI: 10.1088/0268-1242/14/10/310

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