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Radiofrequency plasma decomposition of CnF2n+2-H2and CF4-C2F4mixtures during Si etching or fluoropolymer deposition

✍ Scribed by Riccardo d'Agostino; Santolo Benedictis; Francesco Cramarossa

Publisher: Springer
Year: 1984
Tongue: English
Weight: 638 KB
Volume: 4
Category: Article
ISSN: 0272-4324
DOI: 10.1007/bf00567367

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