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Radiofrequency plasma decomposition of CnF2n+2-H2and CF4-C2F4mixtures during Si etching or fluoropolymer deposition

✍ Scribed by Riccardo d'Agostino; Santolo Benedictis; Francesco Cramarossa


Publisher
Springer
Year
1984
Tongue
English
Weight
638 KB
Volume
4
Category
Article
ISSN
0272-4324

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