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Quantum Yields of Photoacid Generation in 193-nm Chemically Amplified Resists by Fluorescence Imaging Spectroscopy

โœ Scribed by Ray, Krishanu; Mason, Michael D.; Grober, Robert D.; Pohlers, Gerd; Staford, Carolyne; Cameron, James F.


Book ID
126227379
Publisher
American Chemical Society
Year
2004
Tongue
English
Weight
176 KB
Volume
16
Category
Article
ISSN
0897-4756

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