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Quantitative TEM analysis of Al/Cu multilayer systems prepared by pulsed laser deposition

✍ Scribed by H. H. Liu; N. Pryds; J. Schou; X. Huang

Publisher
Springer
Year
2010
Tongue
English
Weight
380 KB
Volume
101
Category
Article
ISSN
1432-0630

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Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO ) (Al O ) ceramic target. The 2 0.5 2 3 0.5 Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 8C substrate temperat