Quantitative AES and XPS investigation of magnetron sputtered TiNx films

Quantitative AES investigation of magnet

Quantitative AES investigation of magnetron sputtered Ti-Al-N films

✍ Bor-Yuan Shew; Jow-Lay Huang 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 729 KB

Investigation of NiSi and Pd3Si thin fil

Investigation of NiSi and Pd3Si thin films by AES and XPS

✍ Atzrodt, V. ;Wirth, Th. ;Lange, H. 📂 Article 📅 1980 🏛 John Wiley and Sons 🌐 English ⚖ 406 KB

XPS, XANES and ToF-SIMS Characterization

XPS, XANES and ToF-SIMS Characterization of Reactively Magnetron-sputtered Carbon Nitride Films

✍ Lopez, S.; Dunlop, H. M.; Benmalek, M.; Tourillon, G.; Wong, M.-S.; Sproul, W. D 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 English ⚖ 443 KB 👁 2 views

The existence of with hardness characteristics similar or better than diamond was predicted in 1990 by Liu b-C 3 N 4 and Cohen. Many studies have since been devoted to the synthesis of this compound. In the present work, carbon nitride Ðlms were deposited by various reactive magnetron sputtering pro

XPS, XANES and ToF-SIMS Characterization

XPS, XANES and ToF-SIMS Characterization of Reactively Magnetron-sputtered Carbon Nitride Films

✍ Lopez, S.; Dunlop, H. M.; Benmalek, M.; Tourillon, G.; Wong, M.-S.; Sproul, W. D 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 English ⚖ 444 KB 👁 2 views

The existence of with hardness characteristics similar or better than diamond was predicted in 1990 by Liu b-C 3 N 4 and Cohen. Many studies have since been devoted to the synthesis of this compound. In the present work, carbon nitride Ðlms were deposited by various reactive magnetron sputtering pro

XPS and AES investigations of hard magne

XPS and AES investigations of hard magnetic Nd–Fe–B films

✍ S. Oswald; S. Fähler; S. Baunack 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 163 KB

Quantitative AES analysis and preferenti

Quantitative AES analysis and preferential sputtering of titanium silicide thin films

✍ Palacio, C. 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 98 KB 👁 2 views

Quantitative AES analysis of TiSi x (1.3 ≤ x ≤ 2.1) thin films deposited on silicon by co-sputtering in a magnetron system has been performed. The time variation of the surface composition during sputtering with Ar Y ions of 3 keV energy has been explained using a kinetic model that allows one to de