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Pulsed laser deposition system for producing oxide thin films at high temperature

โœ Scribed by Orita, M.; Ohta, H.; Hiramatsu, H.; Hirano, M.; Den, S.; Sasaki, M.; Katagiri, T.; Mimura, H.; Hosono, H.

Book ID
121733347
Publisher
American Institute of Physics
Year
2001
Tongue
English
Weight
379 KB
Volume
72
Category
Article
ISSN
0034-6748

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Undoped ZnO, Al-doped ZnO (AZO) and Ga-doped ZnO (GZO) thin films were deposited on silica glass substrate at room temperature in a vacuum by KrF excimer laser (ฮป = 248 nm) pulsed laser deposition method. The transparency of ZnO thin films showed the dependence on deposition area. The relationship b