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Pulsed laser deposition of Er3+-doped oxyfluoride thin films

โœ Scribed by M. Martino; A.P. Caricato; A. Fazzi; F. Romano; V.K. Tikhomirov; A.B. Seddon; M. Mattarelli; A. Chiappini; K.C. Vishnubhatla


Book ID
116668586
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
275 KB
Volume
351
Category
Article
ISSN
0022-3093

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Phospho-tellurite glass thin films have been deposited on silica substrates using an ArF laser (k = 193 nm, s = 20 ns) at a laser fluence of 3.2 J/cm 2 and for various oxygen pressures, substrate temperatures and target-to-substrate distances. The measured propagation losses of the phospho-tellurite