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Fabrication of Er3+ doped oxyfluoride-silicate glass film by pulsed laser deposition for planar amplifier

✍ Scribed by S. Shen; W.H. Chow; D.P. Steenson; A. Jha


Book ID
116671758
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
678 KB
Volume
355
Category
Article
ISSN
0022-3093

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Phospho-tellurite glass thin films have been deposited on silica substrates using an ArF laser (k = 193 nm, s = 20 ns) at a laser fluence of 3.2 J/cm 2 and for various oxygen pressures, substrate temperatures and target-to-substrate distances. The measured propagation losses of the phospho-tellurite