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Pulsed ion beam irradiation of silicon

✍ Scribed by W.K. Chu; S.R. Mader; E.F. Gorey; J.E.E. Baglin; R.T. Hodgson; J.M. Neri; D.A. Hammer

Book ID
107834124
Publisher
Elsevier Science
Year
1982
Weight
362 KB
Volume
194
Category
Article
ISSN
0167-5087

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Various polymers were irradiated with high energy ( Ο³ 500 keV) carbon and hydrogen ion beams obtained from a high intensity pulsed power source. Energy deposition was in the range of 0.1-5 J/cm 2 during each pulse, and ion penetration was limited to a few microns. The rapid energy deposition ( < 500