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Pulsed electron beam annealing of Be-implanted InSb

โœ Scribed by H.W. Alberts; R. Cilliers


Book ID
113279063
Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
458 KB
Volume
35
Category
Article
ISSN
0168-583X

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Pulsed electron-beam annealing of ion-im
๐Ÿ“‚ Article ๐Ÿ“… 1980 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 162 KB

width of the energy distribution curve, ranging from about 50 to 15 eV FWHM, is found to depend on the applied voltage VA and the length-to-diameter ratio (+ of the channel, and to vary with output current. The results can be explained in terms of the normalized field strength near the output end of