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Pulse intense metal-ion diode with a vacuum arc plasma anode

โœ Scribed by Nakagawa, Y.


Book ID
117862027
Publisher
IEEE
Year
1991
Tongue
English
Weight
474 KB
Volume
19
Category
Article
ISSN
0093-3813

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Metallic film deposition using a vacuum
โœ Isak I. Beilis; Raymond L. Boxman ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 994 KB

Conventional metallic film deposition techniques are compared with the hot refractory anode vacuum arc (HRAVA) developed in the last decade. In the HRAVA process, the anode is heated by the arc, and a dense plasma plume of cathode material is formed by re-evaporation of cathode material from the ano