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Proton beam writing: a platform technology for nanowire production

โœ Scribed by J. A. van Kan; F. Zhang; S. Y. Chiam; T. Osipowicz; A. A. Bettiol; F. Watt

Book ID
106185408
Publisher
Springer-Verlag
Year
2008
Tongue
English
Weight
342 KB
Volume
14
Category
Article
ISSN
0946-7076

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Hydrogen silsesquioxane a next generatio
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โœ J.A. van Kan; A.A. Bettiol; F. Watt ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 423 KB

In proton beam writing (PBW) the only compatible resists which have demonstrated sub-100 nm features are PMMA and SU-8. In this paper, we present results on PBW using a new non C based, hydrogen silsesquioxane (HSQ) resist. The results obtained with PBW using the HSQ resist, show that HSQ behaves as