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Properties of stacked dielectric films composed of SiO2/Si3N4/SiO2

โœ Scribed by S. Santucci; L. Lozzi; M. Passacantando; A.R. Phani; E. Palumbo; G. Bracchitta; R. De Tommasis; A. Torsi; R. Alfonsetti; G. Moccia


Book ID
117149559
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
369 KB
Volume
245
Category
Article
ISSN
0022-3093

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