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Properties of sputtered amorphous and microcrystalline GaAs films

✍ Scribed by H. Reuter; H. Schmitt; M. Böffgen


Book ID
107864382
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
673 KB
Volume
254
Category
Article
ISSN
0040-6090

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Amorphous and microcrystalline GeC:H fil
✍ Saito, N. ;Iwata, H. ;Nakaaki, I. ;Nishioka, K. 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 405 KB

## Abstract Hydrogenated germanium‐carbon alloy (GeC:H) films have been deposited by a reactive rf magnetron sputtering of Ge in methane–argon gas mixtures. As the second sputtering gas, helium is utilized in order to control the film properties. The effect of helium partial pressure ratio __R__ to