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Properties of epitaxial silicon layers on buried silicon nitride produced by ion implantation : W. Skorupa, U. Kreissig, H. Oertel and H. Bartsch. Vacuum36(11/12), 933 (1986)


Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
135 KB
Volume
27
Category
Article
ISSN
0026-2714

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