Thin CNx films prepared by vacuum rapid
β
G Beshkov; DB Dimitrov; St Georgiev; P Petrov; L Zambov; B Ivanov; C Popov; M Ge
π
Article
π
1998
π
Elsevier Science
π
English
β 269 KB
The properties of thin CN x layers prepared by rapid thermal annealing (RTA) are compared with CN x layers obtained from N 2 plasma treatment. Carbon films of 6000 A Λthickness were deposited by magnetron sputtering system on p-type silicon substrates. The samples were treated in an RTA system in N