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Properties of CuInSe2 films prepared by the rapid thermal annealing technique

✍ Scribed by S.R. Kumar; R.B. Gore; R.K. Pandey


Book ID
107864328
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
578 KB
Volume
223
Category
Article
ISSN
0040-6090

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Thin CNx films prepared by vacuum rapid
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The properties of thin CN x layers prepared by rapid thermal annealing (RTA) are compared with CN x layers obtained from N 2 plasma treatment. Carbon films of 6000 A ˚thickness were deposited by magnetron sputtering system on p-type silicon substrates. The samples were treated in an RTA system in N