Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide

✍ Scribed by D. I. Tetelbaum; A. N. Mikhaylov; A. I. Belov; A. V. Ershov; E. A. Pitirimova; S. M. Plankina; V. N. Smirnov; A. I. Kovalev; R. Turan; S. Yerci; T. G. Finstad; S. Foss

• Book ID: 111446372
• Publisher: SP MAIK Nauka/Interperiodica
• Year: 2009
• Tongue: English
• Weight: 368 KB
• Volume: 51
• Category: Article
• ISSN: 1063-7834
• DOI: 10.1134/s1063783409020334