Properties and electric characterizations of tetraethyl orthosilicate-based plasma enhanced chemical vapor deposition oxide film deposited at 400°C for through silicon via application

✍ Scribed by Su, Meiying; Yu, Daquan; Liu, Yijun; Wan, Lixi; Song, Chongshen; Dai, Fengwei; Xue, Kai; Jing, Xiangmeng; Guidotti, Daniel

• Book ID: 121369224
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 478 KB
• Volume: 550
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2013.11.002