Projection lithography with high numerical aperture optics: W. G. Oldham and A. R. Neureuther. Solid St. Technol. p. 106 (May 1981)

Optical requirements for projection lith

Optical requirements for projection lithography: W. G. Oldham, S. Subramanian and A. R. Neureuther Solid-State Electron.24 (10), 975 (1981)

📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 97 KB

The pace at which technologies for producing and packaging integrated circuits have advanced has been very rapid over the past few years and shows no signs of slowing down. Examples of the newest innovations include programmable integrated circuits and, more recently still, optical electronics. The