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Profile Evolution in High-Dose Ion Implantation. A Computer Simulation Study

✍ Scribed by Karpuzov, D. S.

Publisher: John Wiley and Sons
Year: 1986
Tongue: English
Weight: 357 KB
Volume: 94
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210940146

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