✦ LIBER ✦

Productivity in metrology

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 49 KB
Volume: 18
Category: Article
ISSN: 0961-1290
DOI: 10.1016/s0961-1290(05)71211-4

No coin nor oath required. For personal study only.

✦ Synopsis

KLA-Tencor has introduced

Archer AIM+, its latest overlay metrology solution to address chipmakers' lithography overlay control needs beyond the 65nm node.

Archer AIM+ drops total measurement uncertainty (TMU) by 50% and increases throughput by up to 20%, compared to KLA-Tencor's previous Archer AIM system.

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