𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Productivity in metrology


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
49 KB
Volume
18
Category
Article
ISSN
0961-1290

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✦ Synopsis


KLA-Tencor has introduced

Archer AIM+, its latest overlay metrology solution to address chipmakers' lithography overlay control needs beyond the 65nm node.

Archer AIM+ drops total measurement uncertainty (TMU) by 50% and increases throughput by up to 20%, compared to KLA-Tencor's previous Archer AIM system.


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