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Production of thin films with use of a cylindrical low energy ion gun

โœ Scribed by JM Depauw; M Renier; M Hannotiau; AA Lucas

Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
357 KB
Volume
36
Category
Article
ISSN
0042-207X

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โœ Gorris, F. ;Krug, C. ;Kubsky, S. ;Baumvol, I. J. R. ;Schulte, W. H. ;Rolfs, C. ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 188 KB ๐Ÿ‘ 2 views

An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of