Production of high-purity vanadium, chromium and titanium for use in low activation materials
β Scribed by D. Murphy; G.J. Butterworth
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 401 KB
- Volume
- 191-194
- Category
- Article
- ISSN
- 0022-3115
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar
Scatchard analysis of binding of 125I-basic fibroblast growth factor (FGF) to baby hamster kidney (BHK) cells revealed the presence of two binding sites: a high affinity site with KD of 20 pM and 80,000 sites per cell and a low affinity site with KD of about 2 nM and 600,000 sites per cell. The bind