Linear-accelerator-based high energy imp
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P. Boisseau; A.S. Denholm; H.F. Glavish; G. Simcox
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Article
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1989
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Elsevier Science
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English
β 636 KB
The need for moderate and high dose implants at high energies has led to the use of r.f acceleration techniques for ion implantation. The Eaton NV-IO00 implanter is based on the independently phased r.f linear accelerator (linac), injected with a conventional 80 keV machine. The use of r.f accelerat