𝔖 Bobbio Scriptorium
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Production high-energy ion implanters with milliampere beam capabilities

✍ Scribed by P. Boisseau; A. Dart; A.S. Denholm; H.F. Glavish; B. Libby; G. Simcox


Book ID
113279722
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
410 KB
Volume
37-38
Category
Article
ISSN
0168-583X

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πŸ“œ SIMILAR VOLUMES


Linear-accelerator-based high energy imp
✍ P. Boisseau; A.S. Denholm; H.F. Glavish; G. Simcox πŸ“‚ Article πŸ“… 1989 πŸ› Elsevier Science 🌐 English βš– 636 KB

The need for moderate and high dose implants at high energies has led to the use of r.f acceleration techniques for ion implantation. The Eaton NV-IO00 implanter is based on the independently phased r.f linear accelerator (linac), injected with a conventional 80 keV machine. The use of r.f accelerat

Ion beams with high energy resolution
✍ J. GΓΆrres; C. Rolfs πŸ“‚ Article πŸ“… 1985 πŸ› Elsevier Science 🌐 English βš– 187 KB