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Processing effects on the dissolution properties of thin chemically amplified photoresist films

✍ Scribed by D. Drygiannakis; I. Raptis; G.P. Patsis; A. Boudouvis; K. vanWerden

Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 155 KB
Volume: 85
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2007.12.071

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