Maskless device fabrication technology u
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Yamada, Takashi ;Nogawa, Kaoru ;Nishikawa, Madoka ;Harada, Yasoo
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Article
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1993
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John Wiley and Sons
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English
β 953 KB
## Abstract A maskless process for MMICs using highly sensitive posiβtype EB resists was developed using our integrated microwave CAD/CAM system. The process can fabricate fine patterns with 0.1βΞΌm levels and align layerβtoβlayer and fieldβtoβfield within an accuracy below 0.05 ΞΌm (Ο) using two typ