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Process technology optimization using an integrated process and device simulation sequencing system

✍ Scribed by Rudi Cartuyvels; Richard Booth; Luc Dupas; Kristin De Meyer


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
259 KB
Volume
19
Category
Article
ISSN
0167-9317

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Maskless device fabrication technology u
✍ Yamada, Takashi ;Nogawa, Kaoru ;Nishikawa, Madoka ;Harada, Yasoo πŸ“‚ Article πŸ“… 1993 πŸ› John Wiley and Sons 🌐 English βš– 953 KB

## Abstract A maskless process for MMICs using highly sensitive posi‐type EB resists was developed using our integrated microwave CAD/CAM system. The process can fabricate fine patterns with 0.1‐μm levels and align layer‐to‐layer and field‐to‐field within an accuracy below 0.05 ΞΌm (Οƒ) using two typ