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Process integration of 20 nm electron beam lithography and nanopatterning for ultimate MOSFET device fabrication

✍ Scribed by J. Kretz; L. Dreeskornfeld

Book ID: 114155373
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 599 KB
Volume: 61-62
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(02)00434-3

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