Prevention of the Reduction of CuO during X-ray Photoelectron Spectroscopy Analysis

✍ Scribed by Iijima, Yoshitoki; Niimura, Noriyasu; Hiraoka, Kenzo

• Publisher: John Wiley and Sons
• Year: 1996
• Tongue: English
• Weight: 436 KB
• Volume: 24
• Category: Article
• ISSN: 0142-2421
• DOI: 10.1002/(sici)1096-9918(199603)24:3<193::aid-sia94>3.0.co;2-c

✦ Synopsis

A method to prevent the reduction of CuO formed on Cu metal during x-ray photoelectron spectroscopy analysis is presented. When a bias voltage of -250 V was applied to the sample surface in the case of non-monochromatic Mg Ka,, irradiation, the reduction of CuO to the lower oxide (Cuz+ * Cu+) was suppressed by SO-90% as compared with ordinary non-monochromatic x-ray irradiation. The degree of CuO reduction is the same as in the case of monochromatic A1 Ka x-ray irradiation. It was found that slow electrons generated from the x-ray window and photoelectrons emitted from the surface by x-ray irradiation cause the reduction. As the reduction can be minimized by applying a bias voltage to the surface, the bias voltage method is very effective for preventing CuO reduction.