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Pressure and temperature dependence of the gas-phase reaction between methyl and hydroxyl radicals

✍ Scribed by Kjell Fagerström; Anders Lund; Gharib Mahmoud; Jerzy T. Jodkowski; Emil Ratajczak

Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
768 KB
Volume
224
Category
Article
ISSN
0009-2614

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✦ Synopsis

The kinetics of the reaction CHs + OH ( +M ) -CH,OH( + M ) was studied in the temperature range 283-373 K and in the pressure range 85-1000 mbar SF, by pulse radiolysis combined with UV absorption spectroscopy. The methyl and hydroxyl radical decays were followed by monitoring the transient UV absorption signals at 216.4 nm and 309.0 nm respectively. The reaction was studied in the fall-off region and by Troe's analysis the following high-and low-pressure limiting rate constants were obtained: &_= (8.7f0.7)~ 10Lo(T/300)o~L M-r s-r and ko/[SF,] = (9.0f2.4)~ 1014(T/300)-3~8 Me2 s-r. The lowpressure limiting rate constant for the OH radical self-reaction was also derived: k&.r+oH,O /[SF,]=(4.0f0.7)x10"(T/300)-'~4 Mm2 s-' using the value of kou+oH,m= 1.8~ 10Lo( T/300)-0~37M-' s-r for the high-pressure limit.

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