Preparation of zinc oxide/metal oxide multilayered thin films for low-voltage varistors
β Scribed by N Horio; M Hiramatsu; M Nawata; K Imaeda; T Torii
- Publisher
- Elsevier Science
- Year
- 1998
- Tongue
- English
- Weight
- 288 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0042-207X
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β¦ Synopsis
Zinc oxide/metal oxide multilayered composite thin film varistors have been fabricated by the radio-frequency (RF, 13.56 MHz) sputtering method and the electrical properties of the films were investigated. After the Au electrode was formed on a quartz substrate by vacuum evaporation, zinc oxide (ZnO) layer was deposited by the RF sputtering with ZnO target at room temperature, Ar partial pressure of 2.5 Pa, O 2 partial pressure of 2.5 Pa and RF power of 50 W. Praseodymium oxide (Pr 6 O 11 ) layer was formed on the ZnO layer by the RF sputtering with Pr 6 O 11 target at room temperature, Ar pressure of 5 Pa and RF power of 80 W. The upper Au electrode was formed on the Pr 6 O 11 layer by vacuum evaporation. The conduction mechanism of the ZnO/Pr 6 O 11 double-layered thin film varistor was discussed on the basis of the measurements of voltage-current (V-I) and capacitance-voltage (C-V) characteristics and thermally stimulated current (TSC). From the results of V-I and C-V measurements, it was found that a depletion region was formed in the ZnO layer close to the interface between ZnO and Pr 6 O 11 layers.
π SIMILAR VOLUMES
Indium-tin-oxide (ITO) thin films and ITO/Ag alloy/ITO multilayered thin films were deposited on glass substrates using a vertical in-line multilayer sputtering system. Ceramic ITO targets were used for the deposition of ITO layers at low substrate temperature of 100 β’ C. It was observed that the s