Doping and microwave power effects in th
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S.F. Yoon; R Ji; J Ahn
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Article
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1997
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Elsevier Science
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English
⚖ 895 KB
## This paper reports the deposition of hydrogenated silicon carbide ISiC:HI films using the electron cyclotron resonance chemical vapour deposition (EC!?-CVD) technique. Using this technique, SiC:H films were prepared from a mixture of methane, silane and hydrogen, with phosphine as the doping gas.