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Preparation of n-type SiC:H using ECR—CVD: some effects of microcrystallite silicon formation induced by phosphorus doping and microwave power

✍ Scribed by S.F. Yoon; R. Ji; J. Ahn


Book ID
114194237
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
779 KB
Volume
49
Category
Article
ISSN
0254-0584

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✍ S.F. Yoon; R Ji; J Ahn 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 895 KB

## This paper reports the deposition of hydrogenated silicon carbide ISiC:HI films using the electron cyclotron resonance chemical vapour deposition (EC!?-CVD) technique. Using this technique, SiC:H films were prepared from a mixture of methane, silane and hydrogen, with phosphine as the doping gas.