MOCVD (metalยฑorganic chemical vapor deposition) of new materials, such as perovskite-type ceramic thin ยฎlms, will be a major key technology in the ยฎeld of ULSI non-volatile and volatile memory applications. This article outlines the latest trends in the ยฎeld of MOCVD equipment and process developmen
โฆ LIBER โฆ
Preparation of Molybdenum Oxide Thin Films by MOCVD.
โ Scribed by R. Martinez Guerrero; J. R. Vargas Garcia; V. Santes; E. Gomez
- Publisher
- John Wiley and Sons
- Year
- 2007
- Weight
- 13 KB
- Volume
- 38
- Category
- Article
- ISSN
- 0931-7597
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