๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Preparation of Ge-Si epitaxial alloys by sputtering

โœ Scribed by Kentaro Ito


Book ID
107789046
Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
446 KB
Volume
45
Category
Article
ISSN
0022-0248

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Epitaxy of Si-Ge heterostructures by Si
โœ J.-M. Baribeau; D.C. Houghton; D.J. Lockwood; M.W.C. Dharma-Wardana; G.C. Aers ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 345 KB
Structure and property of Ge/Si nanomult
โœ Shihua Huang; Zhou Xia; Hong Xiao; Jufang Zheng; Yunlong Xie; Guanqun Xie ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 316 KB

Ge/Si nanomultilayers were prepared using magnetron sputtering deposition and adjusting the growth conditions, such as the substrate temperature, sputtering pressure, sputtering power and annealing temperature. The surface topography and microstructure of the nanomultilayers were characterized by X-

Hot-press sintering of Ge-Si alloys
โœ N. Savvides; H. J. Goldsmid ๐Ÿ“‚ Article ๐Ÿ“… 1980 ๐Ÿ› Springer ๐ŸŒ English โš– 516 KB