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Preparation of copper and copper oxide films by metal-organic chemical vapour deposition using β-ketoiminato complexes

✍ Scribed by Tobias Gerfin; Michael Becht; Klaus-Hermann Dahmen

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
296 KB
Volume
17
Category
Article
ISSN
0921-5107

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✍ A. Grodzicki; I. Łakomska; P. Piszczek; I. Szymańska; E. Szłyk 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 892 KB

Volatile precursors of copper, silver and gold for chemical vapour deposition (CVD) of metallic layers are described. There is considerable research interest in CVD because it provides advantages such as selective deposition, control of film density and thickness, etc. over other physical deposition