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Preparation and characterization of single crystalline SnO2 films deposited on α-Al2O3 (0001) by MOCVD

✍ Scribed by Xianjin Feng; Jin Ma; Fan Yang; Feng Ji; Caina Luan


Book ID
113791607
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
349 KB
Volume
62
Category
Article
ISSN
0167-577X

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✍ Caina Luan; Jin Ma; Zhen Zhu; Lingyi Kong; Qiaoqun Yu 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 322 KB

Tin oxide (SnO 2 ) epitaxial thin films have been prepared on TiO 2 (0 0 1) substrates at different temperatures by metalorganic chemical vapor deposition (MOCVD) method. The obtained films were pure SnO 2 with the tetragonal rutile structure. An in-plane orientation relationship of (0 0 1) SnO 2 :(