Prediction of resolution using wet-develop type single layer and dry-development process for EUV lithography

✍ Scribed by Shigeyasu Mori; Shigeru Shirayone; Shigeo Irie; Nobuyuki Matsuzawa; Hiroaki Oizumi; Ei Yano; Shinji Okazaki; Atsushi Miyafuji; Takeo Watanabe; Hiroo Kinoshita; Tetsuya Oshio; Katsumi Sugisaki

• Book ID: 108411130
• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 502 KB
• Volume: 53
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(00)00406-8