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Precursor Oxidation State Control of Film Stoichiometry in the Metal−Organic Chemical Vapor Deposition of Tin Oxide Thin Films

✍ Scribed by Suh, Seigi; Hoffman, David M.; Atagi, Lauren M.; Smith, David C.; Liu, Jia-Rui; Chu, Wei-Kan

No coin nor oath required. For personal study only.

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