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Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor

✍ Scribed by Remolina, A; Monroy, B M; García-Sánchez, M F; Ponce, A; Bizarro, M; Alonso, J C; Ortiz, A; Santana, G

No coin nor oath required. For personal study only.

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