β Scribed by Larry F. Thompson, C. Grant Willson, and Seiichi Tagawa (Eds.)
No coin nor oath required. For personal study only.
Content: Chemical amplification mechanisms for microlithography / E. Reichmanis, F.M. Houlihan, O. Nalamasu, and T.X. Neenan --
Synthesis of 4-(tert-butoxycarbonyl)-2,6-dinitrobenzyl tosylate : a potential generator and dissolution inhibitor solubilizable through chemical amplification / F.M. Houlihan, E. Chin, O. Nalamasu, and J.M. Kometani --
Chemically amplified deep-UV photoresists based on acetal-protected poly(vinylphenols) / Ying Jiang and David R. Bassett --
Novel analytic method of photoinduced acid generation and evidence of photosensitization via matrix resin / N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, and M. Hanabata --
Acid-catalyzed dehydration : a new mechanism for chemically amplified lithographic imaging / H. Ito, Y. Maekawa, R. Sooriyakumaran, and E.A. Mash --
An alkaline-developable positive resist based on silylated polyhydroxystyrene for KrF excimer laser lithography / Eiichi Kobayashi, Makoto Murata, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, and Takao Miura --
A test for correlation between residual solvent and rates of N-methylpyrrolidone absorption by polymer films / W.D. Hinsberg, S.A. MacDonald, C.D. Snyder, H. Ito, and R.D. Allen --
Dissolution rates of copolymers based on 4-hydroxystyrene and styrene / C.-P. Lei, T. Long, S.K. Obendorf, and F. Rodriguez --
Synthesis and polymerizations of N-(tert-butoxy)maleimide and application of its polymers as a chemical amplification resist / Kwang-Duk Ahn and Deok-Il Koo --
Acid-sensitive pyrimidine polymers for chemical amplification resists / Yoshiaki Inaki, Nobuo Matsumura, and Kiichi Takemoto --
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists / R.D. Allen, G.M. Wallraff, W.D. Hinsberg, L.L. Simpson, and R.R. Kunz --
Surface-imaging resists using photogenerated acid-catalyzed SiOβ formation by chemical vapor deposition / Masamitsu Shirai and Masahiro Tsunooka --
Polysilphenylenesiloxane resist with three-dimensional structure / K. Watanabe, E. Yano, T. Namiki, and Y. Yoneda --
Top-surface imaging using selective electroless metallization of patterned monolayer films / J.M. Calvert, W.J. Dressick, C.S. Dulcey, M.S. Chen, J.H. Georger, D.A. Stenger, T.S. Koloski, and G.S. Calabrese --
Langmuir-Blodgett deposition to evaluate dissolution behavior of multicomponent resists / V. Rao, W.D. Hinsberg, C.W. Frank, and R.F.W. Pease --
Photochemical control of a morphology and solubility transformation in poly(vinyl alcohol) films induced by interfacial contact with siloxanes and phenol-formaldehyde polymeric photoresists / James R. Sheats --
Advances in the chemistry of resists for ionizing radiation / Ralph Dammel --
Out-of-plane expansion measurements in polyimide films / Michael T. Pottiger and John C. Coburn --
Radiation-induced modifications of allylamino-substituted polyphosphazenes / M.F. Welker, H.R. Allcock, G.L. Grune, R.T. Chern, and V.T. Stannett --
Synthesis of perfluorinated polyimides for optical applications / Shinji Ando, Tohru Matsuura, and Shigekuni Sasaki --
Charged species in [sigma]-conjugated polysilanes as studied by absorption spectroscopy with low-temperature matrices / K. Ushida, A. Kira, S. Tagawa, Y. Yoshida, and H. Shibata --
Acid-sensitive phenol-formaldehyde polymeric resists / W. Brunsvold, W. Conley, W. Montgomery, and W. Moreau --
Superiority of bis(perfluorophenyl) azides over nonfluorinated analogues as cross-linkers in polystyrene-based deep-UV resists / Sui Xiong Cai, M.N. Wybourne, and John F.W. Keana --
New photoresponsive polymers bearing norbornadiene moiety : synthesis by selective cationic polymerization of 2-(3-phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl vinyl ether and photochemical reaction of the resulting polymers / T. Nishikubo, A. Kameyama, K. Kishi, and C. Hijikata --
Photoinitiated thermolysis of poly(5-norbornene 2,3-dicarboxylates) : a way to polyconjugated systems and photoresists / Ernst Zenkl, Michael Schimetta, and Franz Stelzer --
Recent progress of the application of polyimides to microelectronics / Daisuke Makino --
Base-catalyzed cyclization of ortho-aromatic amide alkyl esters : a novel approach to chemical imidization / W. Volksen, T. Pascal, J.W. Labadie, and M.I. Sanchez --
Base-catalyzed photosensitive polyimide / D.R. McKean, G.M. Wallraff, W. Volksen, N.P. Hacker, M.I. Sanchez, and J.W. Labadie --
Novel cross-linking reagents based on 3,3-dimethyl-1-phenylenetriazene / Aldrich N.K. Lau and Lanchi P. Vo --
Preparation of novel photosensitive polyimide systems via long-lived active intermediates / Takahi Yamashita and Kazuyuki Horie --
Photoregulation of liquid-crystalline orientation by anisotropic photochromism of surface azobenzenes / Yuji Kawanishi, Takashi Tamaki, and Kunihiro Ichimura --
Factors affecting the stability of polypyrrole films at higher temperatures / V.-T. Truong and B.C. Ennis --
Intrinsic and thermal stress in polyimide thin films / M. Ree and D.P. Kirby --
Fluorinated, soluble polyimides with high glass-transition temperatures based on a new, rigid, pentacyclic dianhydride : 12,14-diphenyl-12,14-bis-(trifluoromethyl)-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic dianhydride / Brian C. Auman and Swiatoslaw Trofimenko --
Processable fluorinated acrylic resins with low dielectric constants / Henry S.-W. Hu and James R. Griffith --
Enhanced processing of poly(tetrafluoroethylene) for microelectronics applications / Charles R. Davis and Frank D. Egitto --
Fluorinated poly(arylene ethers) with low dielectric constants / Frank W. Mercer, David W. Duff, Timothy D. Goodman, and Janusz B. Wojtowicz --
Microstructural characterization of thin polyimide films by positron lifetime spectroscopy / A. Eftekhari, A.K. St. Clair, D.M. Stoakley, Danny R. Sprinkle, and J.J. Singh --
Synthesis and characterization of new poly(arylene ether oxadiazoles) / Frank W. Mercer, Chris Coffin, and David W. Duff.
π SIMILAR VOLUMES
<br> Content: An analysis of process issues with chemically amplified positive resists / O. Nalamasu, A.G. Timko, Elsa Reichmanis, F.M. Houlihan, Anthony E. Novembre, R. Tarascon, N. MuΜnzel, and S.G. Slater --<br/> The annealing concept for environmental stabilization of chemical amplification resi
The topic of thin films is an area of increasingΒ importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-defin
<P>Polymers have beenΒ used as dielectric materials owing to their light weight, great flexibility, and processability as well as high insulation properties. To enhance their performance for various desired dielectric applications, fabrication of polymeric nanocomposites is believed to be one of the
Now in its sixth printing (first in paperback), this book remains an excellent reference for anyone who works in applied physics, engineering, or chemistry. It gives a systematic account of the theory of dielectric properties, and the reader is assumed to have only an acquaintance with calculus, com